Selective step coverage for microfabricated structures

Abstract:

The present invention relates generally to metallization or thin film coating of optical surfaces in micro-optical bench devices, and in particular, shadow masks that provide selective step coverage of optical surfaces in microfabricated structures within micro-optical bench devices. Regarding manufacturing. Generally, to produce micro-optical components and MEMS components that can process a free space light beam propagating parallel to a silicon-on-insulator (SOI) substrate, on a silicon-on-insulator (SOI) wafer. Deep Reactive Ion Etching (DRIE) process is used to form deeply etched micro-optical benches. Traditionally, one-level shadow masks have been used to provide step coverage of optical surfaces in deeply etched micro-optical benches and selective metallization or thin film coating.