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Selective Step Coverage for Microfabricated structures

Abstract:

A shadow mask having two or more levels of openings enables selective step coverage of micro-fabricated structures within a micro-optical bench device. The shadow mask includes a first opening within a top surface of the shadow mask and a second opening within the bottom surface of the shadow mask. The second opening is aligned with the first opening and has a second width less than a first width of the first opening. An overlap between the first opening and the second opening forms a hole within the shadow mask through which selective coating of micro-fabricated structures within the micro-optical bench device may occur.

Images

US20160246010

united states
download pdf
inventor: 
Mostafa Medhat, Bassem Mortada, Yasser Sabry, Sebastian Nazeer, Yasseen Nada, Mohamed Sadek, Bassam A. Saadany
current assignee: 
SI Ware Systems SAE SI Ware Systems Inc
Status: 
Allowed
Status Date: 
November 4, 2019
domain: 
SI Ware Systems SAE SI Ware Systems Inc
worldwide applications: 
2015 . us us . 2026 . kr au ca wo es ep cn mx jp . 2017 . us us 2018 . il

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